In-Situ Thin Film Thickness / Deposition Rate Monitor with Software, and Optional Sensor, Quartz Crystals - TM106-LD Battery Electrode Fabrication Resistivity: >50 Ohm

Resistivity:                       >50  Ohm

L=L1+L2:=200+130=330mm

Vacuum gauge and valves Two vacuum flanges are included for the glove box to achieve vacuum to remove moisture and oxygen without expensive inert gas purging

Max heating or cooling rate < 5oC/ minute

In-Situ Thin Film Thickness / Deposition Rate Monitor with Software, and Optional Sensor, Quartz Crystals - TM106-LD Battery Electrode Fabrication Resistivity: >50 OhmEQ TM106 LD is a high precision thickness sensor monitor for the thin film deposition process. It is based on the principle that the mass of a deposited film on a quartz crystal can be measured by monitoring the change in crystals oscillating frequency. If the density of deposited material is known, the thickness can be determined to a high resolution of sub Angstrom (0. 037 for this equipment). SPECIFICATIONS: Power 5 VDC, 400 mA Frequency Range 6. 0