Al2O3- Sapphire Wafer, R Plane, 10x10x1.0mm, 2SP Orientation 110 2 sides polished

2 sides polished

up to 25mm and compatible with most of the popular coin cell size

Features High precision cutting for hard and brittle nonmetal materials such as Si

Replacement blade for aluminum alloy flange (not included) with 0

Al2O3- Sapphire Wafer, R Plane, 10x10x1.0mm, 2SP Orientation 110 2 sides polishedFeatures: Sapphire substrate is the popular substrates for III V nitrides, superconductor and magnetic epi film due to less mis matched lattice and stable chemical and physical properties Wafer size: 10 mm x 10 mm x 1. 0 mm thick Orientation tolerance: <1 102> + 0. 5 o Polished surface: substrate surface is EPI polished via a special CMP procedure with RA < 5 A Two sides polished Package: Each wafer is packed in 1000 class clean room with 100 grade