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MS00200 - SEMI MS2 - Test Method for Step Height Measurements of Thin Films Revision:SEMI MS2-1109 - Superseded SEMI M1-1117 (technical revision)
MS00200 - SEMI MS2 - Test Method for Step Height Measurements of Thin Films Revision:SEMI MS2-1109 - Superseded SEMI M1-1117 (technical revision)
$193.00
Description
SEMI M1-1117 (technical revision)
The purpose is to:
SEMI M45 — Provisional Standard for 300mm Wafer Shipping System
1-0704 - イベントレポートスタンダードへのSECS-Ⅱ のサポート
MS00200 - SEMI MS2 - Test Method for Step Height Measurements of Thin Films Revision:SEMI MS2-1109 - Superseded SEMI M1-1117 (technical revision)1 Purpose 1. 1 This Test Method enables the determination of step height measurements of thin films. Step height measurements can be used to determine thin film thickness values. Thickness measurements are an aid in the design and fabrication of MEMS devices and can be used to obtain thin film material parameters, such as Youngs modulus. 2 Scope 2. 1 This Test Method presents a procedure for measuring step heights of thin films using step height test
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